Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

Selectable charge removal layoutNozzle angle adjustment and joint layout can be selected as desired.[Features]·Minimum air consumption 15 ℓ/min. (ANR)·Produces excellent ion balance·No damage to electronic devices from inverse charging·Compact and thin design

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

The slit mask restricts the amount of beam emitted or received and is used to reduce interference between neighboring sensors.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Mounting options for GX-6, GX-8, GX-15, GXL-15(F) types.

Equipped with 12-turn potentiometer for fine adjustment.

Equipped with 12-turn potentiometer for fine adjustment.